ASML makes High-NA EUV systems suitable for the largest AI chips – Productivity expected to increase by 40%

ASML aims to make High-NA EUV usable for the largest AI chips and promises up to 40% more productivity. The AI boom is driving demand for state-of-the-art lithography. ASML is already almost booked out for Low-NA EUV by 2027. After a strong Q2, ASML significantly raised its annual forecast to €43 to €45 billion in revenue. ASML intends to develop its next generation of High-NA EUV systems for particularly large AI and data center chips. In chip production, a photomask serves as a template, with its circuit patterns transferred to the...